Home > Equipment Detail
| ID | Function | OEM | Model | Description | Qty |
Price | Status |
| 5221 | ICP ion etcher 蚀刻机 | Branchy Vacuum Technology | P 200 | Inductively Coupled Plasma Reactive Ion Etching 電漿離子蝕刻機 |
2 |
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Contact for this equipment: sales@semicon-equip.com
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